Latif R, Mastropaolo E, Bunting A, Cheung R, Koickal TJ, Hamilton A, Newton M & Smith L (2010) Microelectromechanical Systems for Biomimetical Applications. Journal of Vacuum Science and Technology B, 28 (6), pp. N1-N6. https://doi.org/10.1116/1.3504892
An etch release process capable of releasing long resonant gate transistor bridges from a sacrificial layer has been studied as a step towards developing a system to mimic the cochlear mechanism inside the human ear. The developed etch release process involves the use of a gentle etch tool that is capable of a clean and damage-free etch release. The influence of temperature and oxygen/nitrogen gas flow rates on the undercut etch rates and the profiles of photoresist and polyimide sacrificial layers have been investigated. An array of aluminum bridges of length 0.278-1.618 mm, which cover the frequencies from 1 to 33.86 kHz, has been designed and released from a sacrificial layer. The resonating beams have been measured.
Aluminium; Etching; Micromechanical devices; MOSFET; Photoresists; Aluminum (Al); Photoresist (PR); Polyimide (PI)
Journal of Vacuum Science and Technology B: Volume 28, Issue 6
|Publisher||American Institute of Physics (AIP) / American Vacuum Society|